Since nanoimprinting technology was invented in 1995, it has experienced more than 20 years history of technological development. Because of its excellent technical characteristics: high resolution, low cost, and high productivity, it was considered a star technology at the beginning of its birth. It has received extensive attention from academia and industry and has even been included in the international semiconductor industry technology development blueprint. In addition, the EIPBN conference in the United States, the MNE conference in Europe, and the MNC conference in Japan began to have nanoimprint technology sub-section since the early stage. Until the first NNT conference in 2002, all engineers and scientists from nanoimprint technology finally could have their own annual nanoimprint conference.
The development of nanoimprint technology is not only the result of the development from academia, but also a huge contribution from the industry. While receiving extensive attention in the academic field, nanoimprint technology has also begun to enter the market and the industry. Internationally, from the beginning Nanonex company, Obducat company and Molecular Imprint Inc. have all made great contributions to the development and promotion of nanoimprint technology. In the later period, Suss and EVG also made a lot of contributions to the industrialization development of nanoimprint technology.
With the promotion of nano-imprint technology in China, almost all well-known research institutes and micro-nano processing platforms of universities have widely installed nano-imprint equipment, for example Peking University, Tsinghua University, Shanghai Jiaotong University, Fudan University, University of Science and Technology of China and many institutes of the Chinese Academy of Sciences, In addition, even some famous universities have installed multiple sets of nanoimprinting equipment. According to incomplete statistics, there are currently more than 100 sets of nanoimprinting equipment installed across the country, and hundreds of research groups and project groups are working on or have studied topics related to nanoimprinting technology. But until today, there are no professional conferences on nanoimprint technology in China, and even the branches of related academic conferences are rare.
Especially in recent years, the demand for large-volume, high-precision micro-nano processing in the industry has begun to explode and the signs of this explosion are particularly obvious in the Chinese market. Its demand is present in many fields, including micro-nano optical components, application scenarios such as AR lenses, DOE, TOF and MLA, as well as biomedical health fields, such as biochips, microfluidic channels, microneedles and other application scenarios. A large number of high-tech start-up companies have appeared in these fields and some large listed companies have also begun to deploy in the field of nanoimprint technology, investing huge amounts of funds and resources. Domestic nanoimprint technology companies have also contributed tremendous efforts to it. SVG was established in 2001, Wuxi Imprint was established in 2008, Suzhou Gdnano in 2012, and the latest batch of famous company in the industry, like Qingdao GermanLitho, Shanghai Amis NIL，Hangzhou EurOptics, Xi'an Huatian Huichuang have pushed the industrialization of nanoimprint technology to a new climax in China.
Under such new situation, the Gusu Lab of Materials Science, in conjunction with Suzhou Nano Technology Development Co., Ltd., INL, obducat, etc., will regularly organize NTAC-Global Nanoimprint Technology and Application Conference in Suzhou, aiming to gather global nanoimprint technology industrial resources, to create a brand conference in the nanoimprinting field, to promote the aggregation of talents, the technological innovation and the achievement transformation from nanoimprinting technology to industry, and to accelerate the breakthrough of the development bottleneck in the nanoimprinting technology manufacturing field.
